Atomic layer deposition (ALD) refers to the process of deposition of precursor materials on substrates for improving or modifying properties such as chemical resistance, strength, and conductivity. The process is considered a sub-division of chemical vapor deposition (CVD) in atomic layer deposition. Most of the time, two chemicals are utilized for the reaction, generally called precursors. https://www.databridgemarketresearch.com/reports/global-atomic-layer-deposition-market
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